high purity Metal Target Molybdenum 99.9% 99.95% 99.99% electrodes wiring material

high purity Metal Target Molybdenum 99.9% 99.95% 99.99% electrodes wiring material,
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Zirconium Silicon sputtering target is fabricated by means of vacuum melting and power metallurgy.

The Zirconium present could improve the hardness and corrosion resistance behavior.

Zirconium Silicon target in low in electric conductivity, and could reduce the residual stress, which would improve the stability of coatings and prolong service life. The coatings could be used on Low-E glass for its high consistency and corrosion resistance behavior.

Compared to pure Silicon, High purity Zirconium Silicon sputtering targets could significantly improve the friction resistance of the deposited coating by 4-6 times.

Therefore, Zr-Si is available for many practical applications.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Zirconium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.with low degree of thermal expansion, low heat resistance, and superior thermal conductivity. It has an atomic weight of 95.95, melting point of 2620℃, boiling point of 5560℃ and density of 10.2g/cm³.

Molybdenum sputtering target is a kind of industrial material extensively used in conductive glass, STN/TN/TFT-LCD, ion coating,PVD sputtering, X-ray tubes for mammary industries.

In electronic industry, Molybdenum sputtering targets are used in electrodes or wiring material, in the semiconductor integrated
circuit, flat panel display and solar panel manufacturing for their excellent corrosion resistance and environmental performance.